Helmholtz Zentrum Berlin, Institute on Functional Oxides for Energy-Efficient IT (IFOX)
The information technology systems of the future will require faster, more energy-efficient materials with properties that current materials cannot provide. Discovering these is the role of IFOX, based at Helmholtz-Zentrum Berlin (HZB).
IFOX stands for the Institute for Functional Oxides for Energy-Efficient IT. Researchers, there are looking at extremely Thin Film Metal-Oxides. By manipulating their properties, these materials can be used to control the semiconductors driving the computers of the future.
Growing, characterizing and fabricating devices from these heterostructures - different metal oxides stacked together to exhibit entirely new mechanical, optical and electromagnetic properties – is the goal of IFOX, and researchers there have expertise in all these areas.
From molecular beam epitaxy and atomic layer deposition for growth to SEM and Raman Spectroscopy for characterization, IFOX has the complete facilities for moving this field forwards. It also offers an excellent environment for PhD candidates to begin their careers in this exciting research area.