The physics of lithography resists
By Scott Lewis
Summary
In this webinar, Scott Lewis from Caltech discusses the physics of lithography resists, focusing on electron beam lithography, resist design considerations, and the challenges faced in the semiconductor industry. The session is structured into two parts, with the first part covering electron scattering mechanics, the importance of scaling, and the role of secondary electrons in exposure mechanisms. Scott also presents case studies and insights into future directions in resist technology, emphasizing the complexities of resist development and the significance of understanding electron interactions.
Takeaways
Scott Lewis has over 15 years of experience in resist materials.
Scaling is crucial in the semiconductor industry for cost and efficiency.
Understanding electron scattering mechanics is essential for resist design.
High energy and low energy electron beam tools have different applications and costs.
Resist design considerations include solubility and chemical stability.
The triangle of death illustrates the trade-offs in resist performance.
Secondary electrons play a significant role in exposure mechanisms.
The point spread function is critical for understanding resist behavior.
Chapters
00:00 Introduction and Acknowledgments
03:02 Overview of Scott Lewis and His Work
06:04 Understanding Lithography Resists
08:57 Scaling and Cost in Lithography
11:48 Electron Beam Lithography Tools
15:10 Resist Design Considerations
18:02 Types of Resists and Their Applications
20:53 Challenges in Resist Development
23:51 The Triangle of Death in Resist Specifications
27:09 Anti-Electron Beam Interactions
38:19 Understanding Mean Free Path and Scattering
41:15 The Importance of Stopping Power
44:38 Elastic vs Inelastic Scattering
50:02 Quantum Mechanics and Scattering Models
54:32 Building the Scattering Model
01:03:14 Case Study: Copper and Energy Loss
01:18:14 Understanding Secondary Electrons and Their Impact
01:21:05 Material Properties and Their Effects on Electron Behavior
01:24:30 The Role of Atomic Number and Density in Electron Scattering
01:27:52 Material Solubility and Its Importance in Resist Design
01:31:18 Case Study: Monomer Design and Sensitivity
01:39:02 Point Spread Function and Energy Deposition
01:47:17 Exploring ZEP and Its Unique Properties
01:54:39 Dry Etch Performance and Future Directions