MBMS for Raith periodixx - periodic patterning without stitching errors for EBL and IBL
The Modulated Beam and Moving Stage (MBMS) technology allows stitch-free, strip-shaped periodic structures to be written in electron and ion beam lithography. It is the basis for Raith's dedicated stitch-error-free patterning mode periodixx, which is unique among Gaussian, vector scanning EBL and FIB systems.